Exhaust air cleaning in a wafer washing facility
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Exhaust air cleaning in a wafer washing facility
Process data
Medium
Pollutant-laden washing fluid, strongly acidic
Container
Counter-flow absorber, vertical construction
Measuring range
1 m
Temperature conditions
+25 °C
Process conditions
Condensate and vapour formation, strong turbulence in the washing liquid
Application
Wet chemical cleaning of silicon wafers creates unwanted nitrous gases. To make sure these gases do not exceed statutory limits, the exhaust flow is treated in a downstream exhaust air cleaning system. Flue gas scrubbers are one of the key steps in the treatment process. Washing fluid is pumped in a circuit via a pump station and sprayed finely into the scrubber to bind air pollutants to the liquid. The pollutant-laden washing fluid is periodically replaced with fresh water. In the storage tank, the level of the washing fluid is continuously monitored and kept constant during the process. The level measurement must be independent of the mixing ratio of the washing fluid as well as vapours and condensation in the tank and provide reliable measurement data.
Recommended products
VEGAFLEX 83
The solution
The PFA-coated, TDR level sensor VEGAFLEX 83 is ideal for use in aggressive media.
The sensor is mounted with a flange on one of the connection ports of the washing fluid storage tank.
A controller evaluates the signal from the sensor and ensures precise feed-in of fresh water.
User benefits
- Fail-safe operation of the washing facility through reliable measurement data
- Highly resistant, and therefore long-lasting, sensor
- Maintenance-free and thus more cost-efficient operation of the facility
- Optimal adaptation to the process
Measuring range - Distance
32 m
Process temperature
-40 ... 150 °C
Process pressure
-1 ... 16 bar
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